The equipment of the Laboratory of thin-film technologies allows to carry out a full cycle of research projects: from studying the growth processes of films to obtaining nanostructures and a full diagnosis of structural, physicochemical, magnetic and electrical properties.


Equipment can be divided into the following groups:

  • Vacuum installations

  • Electronic and photolithography

  • Scanning probe microscopy

  • Magnetometry

  • Magnetotransport measurements

  • Server equipment

  • Auxiliary equipment

Access to equipment for third-party research is considered on a case-by-case basis, taking into account the current equipment load and research plans.


Requests for access to installations should be sent to from the leaders of research groups or projects.

Equipment list


Кафедра химии
МГУ им. Ломоносова



Ул. Арбат, 1а

Москва, 119019



Тел. +7 (945) 000-00-00

Факс +7 (945) 000-00-00


UHV analitic Omicron_edited.jpg

Ultrahigh vacuum set-up of molecular beam epitaxy "Omicron"

The universal ultrahigh vacuum complex consisting of two UHV units is designed to produce nanostructures based on metals and semiconductors using molecular beam evaporators, effusion cells, as well as their research using AFM and tunneling microscopy, spectroscopy of characteristic energy loss by electrons, diffraction of fast electrons.


Ultrahigh vacuum deposition system with magnetron sources

The system is designed to produce multicomponent nanostructures of conductive and non-conductive materials by the method of magnetron deposition (2 DC + 2 RF magnetron, rotation of the substrate, heating of the substrate).


High vacuum deposition system SNC-500

High vacuum system for deposition of diamond-like coatings (DLC) using Laser Arc & Filtred Arc PVD methods.

The set-up may modify the coating by adding gases in the process of deposition, for example, acetylene. One can add intermediate layers, for example, Ti, Al, TiN, TiAlN, thereby changing the properties of the coating.


Reactive ion etching system Plasma Lab 80 plus

Compact system for reactive ion etching of metals, dielectrics and semiconductors.

Raith litography.jpg

Electron-beam nanolithography system

E-Line, Raith

Electron lithography system E-Line Raith. The resolution of the electron column (at WD = 2–10 mm) is not worse than 1.1 nm at 20,000 V.


The minimum size of the resulting surface element in the range of 15-20 nm.

Auxiliary equipment for lithography:

  • Centrifuge SM180BT;

  • Laboratory furnace for quick annealing AO-500;

  • Thermostat HP 150-250.


Сканирующий электронно-ионный микроскоп Thermo Scientific Scios 2 DualBeam

Представляет собой аналитическую систему со сверхвысоким разрешением, состоящую из сканирующего электронного микроскопа (SEM) и системы сфокусированного ионного пучка (FIB).Метод дифракции отраженных электронов (EBSD) - микроструктурная методика исследования кристаллографических ориентаций моно- либо поликристаллических твердых тел. Четырехзондовый предметный столик (Prober Shuttle Kleindiek Nanotechnik) – состоит из 4-х наноманипуляторов для проводящих игл и моторизованного держателя образца, общее число степеней свободы 15.  Наличие Prober Shuttle для исследования проводящих свойств нано- и микроструктур внутри микроскопа.

MJB4_Photo litography.jpg

Photolithography Suss Nanotech MJB-4

Manual installation of alignment and exposure for contact lithography base level. Processing plates up to 100 mm.

The limiting resolution is not worse than 0.6 µm at vacuum contact.

The exposure system allows you to work at wavelengths of 250, 300 and 400 nm without replacing the lamp unit.


Ultrasound welding machines

In the laboratory there are two installations for welding of leads by the “ball-wedge” and “wedge-wedge” methods. 

AFM Raman Spectra-02.jpg

Scanning probe microscope Ntegra Spectra with Raman spectrometer

Research methods:

confocal fluorescence / Raman microscopy and spectroscopy, optical microscopy, near-field optical microscopy, atomic force microscopy.

High resolution optical microscope (0.25 micron).


The study of energy transfer processes, for example, the propagation of light in nanotubes and optical fibers, the study of DLC films.

AFM MFM Aura.jpg

Scanning probe microscope Ntegra Aura

It allows one to study the surface topography and magnetic structure of a wide range of materials, including nanostructures.



Equipped with electromagnets, creating fields perpendicular and parallel to the sample plane of up to 1 kOe.


SQUID magnetometer with EVERCOOL MPMS XL 5 system

Measured parameters:
DC magnetization, AC susceptibility, hysteresis, angular dependence of the magnetic moment, specific electrical resistance, Hall effect, magnetoresistance, optical susceptibility.

The magnetometer is equipped with a pressure cell.

Main characteristics:
The strength of the bipolar magnetic field is ± 5 Tesla.
Temperature range 1.9 ÷ 400 K.
The sensitivity of the measurement of magnetization is 10-8 emu.

VSM Lakeshore 7410.JPG

Vibrating sample magnetometer
LakeShore 7401 VSM

Measured parameters:
DC magnetization, AC susceptibility, hysteresis, angular dependence of the magnetic moment, magnetization curves, FORC measurements

Main characteristics:
The strength of the bipolar magnetic field is ± 3 Tesla.
Temperature range 78 ÷ 800 K.
The sensitivity of the measurement of magnetization 10-7 emu.

Nanomoke 2 .jpg

Magnetooptical magnetometer


Highly sensitive magnetometer with a laser spot diameter of 3 microns. Ability to build maps of coercive force.

The possibility of measuring the polar and longitudinal Kerr effect.

Magnetic fields up to 5 kOe.

MOKE Microscope Evico_Kozlov.jpg

Magnetooptical Kerr microscope Evico Magnetics

The possibility of observing the domain structure of films and micro- and nanostructures using the polar, meridional and equatorial Kerr effects. Horizontal magnetic field - 1 - 5 kOe. Vertical magnetic field - up to 9.5 kOe.

Suss Hall effect.jpg

Four-probe system for measuring the spin Hall effect and magnetoresistance of nanostructures based on the Suss probe station

Probe station for measuring magnetoresistance and Hall effect using Lock-In technique.

Agilent vector network analyzer to study the dynamic properties of magnetic nanostructures (9 GHz).


High Performance Computing Servers

Multiprocessor computing cluster for micromagnetic modeling in MagPar and OOMMF programs.

Microcomputer with graphic accelerators Tesla P100 for modeling on MuMax3

Ocean store 5300 V3 (Huawei) mid-tier data storage system, 22 TB.

Equipment of our partners in Vladivostok

  • X-ray diffractometer SmartLab Rigaku with the ability to measure small-angle diffraction;

  • A Ga + ZEISS CrossBeam 1540Ex scanning electron beam scanning electron microscope equipped with an electron diffraction system for reflection, a quadrupole mass spectrometer;

  • ZEISS Libra 200 FE HR transmission electron microscope, equipped with an energy filtration system for electrons, an energy dispersive X-ray spectrometer;

  • ZEISS Ultra 55+ field emission scanning electron microscope equipped with an energy dispersive spectrometer

  • Metallographic microscope Zeiss Observer D1m (Carl Zeiss)

  • Potentiostat-galvanostat PGU100V-1A-E (IPS)

  • Potentiostat-galvanostat PGU200V-500mA (IPS)

  • A device for determining the thickness of coatings, resistance to wear, and also for determining the quality of adhesion of a coating to a substrate

  • Thermostatted flat electrochemical cell ELFLAT-3 (BioLogic)